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    209982-56-9

    Catalog No. EBD5658

    CAS 209982-56-9

    Name 2-Ethyl-2-adamantyl methacrylate

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    Basic Information

    Synonyms: 2-Propenoicacid,2-methyl-,2-ethyltricyclo(3.3.1.13,7)dec-2-ylester 2-ethyltricyclo[3.3.1.13,7]dec-2-yl2-methylprop-2-enoate 2-Ethyl-2-AdamanthylMethacrylate (4-Bromo-2-fluorophenyl)carbamicacidtert-butylester 2-Ethyl-2-adamantylmethacrylate

    Molecular Formula: C16H24O2

    Molecular Weight: 248.36

    MDL Number: MFCD06411144

    Categories: Materials Chemistry > Polymers and Macromolecular Materials > Acrylic and Methacrylic Monomers Materials Chemistry > Surface Modification and Functional Coatings > Coating Crosslinking Precursors

    Product Description:
    2-Ethyl-2-adamantyl methacrylate is a specialized methacrylate monomer featuring a bulky, rigid adamantane group. This structural feature imparts unique properties to the polymers derived from it. Its primary and most significant application is in the field of advanced photoresists for semiconductor manufacturing, particularly for 193-nm immersion lithography and extreme ultraviolet (EUV) lithography. The adamantyl group provides high etch resistance, thermal stability, and transparency at short wavelengths, which are critical for creating high-resolution patterns on silicon wafers. Polymers incorporating this monomer are key components in chemically amplified resists. Beyond photoresists, this monomer is also used in the synthesis of high-performance, cross-linked polymer coatings. The resulting polymers exhibit excellent mechanical strength, chemical resistance, and thermal stability, making them suitable for protective and functional coatings in demanding industrial applications.
    Physical Properties

    Boiling Point: 318.253 °C at 760 mmHg

    Flash Point: 130.896 °C

    Density: 1.047 g/cm3

    mg g kg ml l t